RF Source
Drive ECR plasma generation with a configurable 2.45 GHz microwave source.
The RF/MW source supplies the excitation power for the electron cyclotron resonance (ECR) plasma in the ion source. Operating at 2.45 GHz — in the upper RF / lower microwave band — the unit is designed to supply up to 500 W peak power. The source consists of a solid-state oscillator followed by a series of amplifiers and signal conditioning hardware. The amplifier gain is fixed; output power is adjusted by the user via a software-controlled attenuator. For typical operation, the RF/MW source is pulsed at 100–1000 Hz at a 5–10% duty cycle.
Technical Specifications
- Frequency: 2.45 GHz
- Peak output power: 500 W
- Output impedance: 50 Ω (Type-N connector)
- Front-panel input: 50 Ω SMA connector for external signal input
- Communication ports: RS-232, USB-C, and RJ-45
- Cooling: Series-cooled with the ion source
- Power: Supplied from the mains connection on the primary enclosure